发明名称 SURFACE-EMITTING SEMICONDUCTOR LASER DEVICE AND METHOD FOR PRODUCING THE SAME
摘要 A surface-emitting semiconductor laser device includes a substrate and a semiconductor layer disposed on the substrate. The semiconductor layer includes a first semiconductor multilayer film of a first conductivity type, a first spacer layer, an active layer, a second spacer layer, and a second semiconductor multilayer film of a second conductivity type. The first semiconductor multilayer film and the second semiconductor multilayer film form a cavity. A peak of a pattern of a standing wave formed by the cavity and the center of the active layer are located at different positions.
申请公布号 US2016099549(A1) 申请公布日期 2016.04.07
申请号 US201514827457 申请日期 2015.08.17
申请人 FUJI XEROX CO., LTD. 发明人 JOGAN Naoki;SAKURAI Jun;MURAKAMI Akemi;KONDO Takashi;TAKEDA Kazutaka;HAYAKAWA Junichiro
分类号 H01S5/187;H01S5/343;H01S5/183;H01S5/20 主分类号 H01S5/187
代理机构 代理人
主权项 1. A surface-emitting semiconductor laser device comprising: a substrate; and a semiconductor layer disposed on the substrate, the semiconductor layer including a first semiconductor multilayer film of a first conductivity type,a first spacer layer,an active layer,a second spacer layer, anda second semiconductor multilayer film of a second conductivity type,the first semiconductor multilayer film and the second semiconductor multilayer film forming a cavity, wherein a peak of a pattern of a standing wave formed by the cavity and a center of the active layer are located at different positions.
地址 Tokyo JP