| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition containing β-hydroxyalkyl amide soluble with an organic solvent, from which a film or a fine pattern having sufficient heat-resistance, chemical resistance, smoothness and optical characteristics can be formed. <P>SOLUTION: The photosensitive composition contains a β-hydroxyalkyl amide (A) having a specified structure, a polymer (B) having a carboxyl group, and a photopolymerization initiator (C), and essentially contains a photopolymerizable functional group in the composition. In the photosensitive composition, the β-hydroxyalkyl amide (A) is soluble with an organic solvent. A coating agent for an interlayer insulating film of a touch panel, a photosensitive composition for a color filter, and a photosensitive solder resist ink are provided, comprising the above photosensitive composition. <P>COPYRIGHT: (C)2013,JPO&INPIT |
