APPARATUS FOR FILM DEPOSITION AND METHOD FOR PREPARING THERMOELCTRIC DEVICE USING THE SAME

摘要

Provided are a film deposition apparatus capable of manufacturing a thermoelectric device, requiring selective deposition, using aerosol deposition, and a method for manufacturing a thermoelectric device using the same. The film deposition apparatus according to the present invention comprises: a process chamber which includes a stage transferring a target in a state of supporting the target; a vacuum pump which is connected and combined with the process chamber, and forms a vacuum condition; an aerosol chamber which accommodates powder; a carrier gas container which stores carrier gas; a carrier gas supply pipe which connects the carrier gas container with an interior of the aerosol chamber so as to introduce the carrier gas into the interior of the aerosol chamber; an aerosol transport pipe which guides aerosol, including the powder mixed with the carrier gas, to an interior of the process chamber; a nozzle which is provided at one end of the aerosol transport pipe, and sprays the aerosol onto the target; and a selective deposition blocking unit which is interposed between the nozzle and the target.