发明名称 Electrostatic discharge protection structure
摘要 An ESD protection structure includes a first conductive type substrate; first and second well regions of a first conductive type; a third well region of a second conductive type located between the first and second well regions; a first doped region of the first conductive type and a second doped region of the second conductive type disposed in the first well region; a third doped region of the first conductive type and a fourth doped region of the second conductive type disposed in the second well region; and fifth and sixth doped regions disposed at an interface of the first and third well regions or an interface of the second and third well regions. The fifth doped region of the first conductive type is located in the first or second well region, and the sixth doped region of the second conductive type is located in the third well region.
申请公布号 US9305913(B1) 申请公布日期 2016.04.05
申请号 US201514828510 申请日期 2015.08.17
申请人 Episil Technologies Inc. 发明人 Deng Jing-Sheng;Liu Te-Kun
分类号 H01L29/02;H01L27/02;H01L29/06 主分类号 H01L29/02
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. An electrostatic discharge protection structure, comprising: a substrate, having a first conductive type; a first well region and a second well region, having the first conductive type and disposed separately on the substrate; a third well region, having a second conductive type, disposed on the substrate and located between the first well region and the second well region; a first doped region, having the first conductive type and disposed in the first well region; a second doped region, having the second conductive type and disposed in the first well region; a third doped region, having the first conductive type and disposed in the second well region; a fourth doped region, having the second conductive type and disposed in the second well region; and a fifth doped region and a sixth doped region, disposed adjacent to each other at one of an interface of the first well region and the third well region and an interface of the second well region and the third well region, wherein the fifth doped region has the first conductive type and is located in the first well region or the second well region, and the sixth doped region has the second conductive type and is located in the third well region.
地址 Hsinchu TW