| 发明名称 | Plasma light source, inspection apparatus including plasma light source, and method of generating plasma light | ||
| 摘要 | A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed. | ||
| 申请公布号 | US9305764(B2) | 申请公布日期 | 2016.04.05 |
| 申请号 | US201514613988 | 申请日期 | 2015.02.04 |
| 申请人 | Samsung Electronics Co., Ltd. | 发明人 | Park Young-kyu;Kim Wook-rae;Kim Kwang-soo;Kim Tae-joong;Jeon Byeong-hwan |
| 分类号 | H01J61/28;H01J65/04;G02B27/14 | 主分类号 | H01J61/28 |
| 代理机构 | Myers Bigel & Sibley, PA | 代理人 | Myers Bigel & Sibley, PA |
| 主权项 | 1. A plasma light source comprising: a chamber comprising an ionizable medium therein; an ignition source configured to provide first electromagnetic radiation to the chamber; a sustaining source configured to separately provide second electromagnetic radiation to the chamber; a first curved mirror positioned adjacent the chamber; and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. | ||
| 地址 | KR | ||