| 发明名称 | Lithographic apparatus | ||
| 摘要 | A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy. | ||
| 申请公布号 | US9307624(B2) | 申请公布日期 | 2016.04.05 |
| 申请号 | US200912484812 | 申请日期 | 2009.06.15 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Glushkov Denis Alexandrovich;Banine Vadim Yevgenyevich;Ivanov Vladimir Vitalevich;Koshelev Konstantin Nikolaevich;Zukakishvili Givi Georgievich;Krivtsun Vladimir Mihailovitch;Sidelnikov Yurii Victorovitch;Gielissen Kurt;Yakushev Oleg |
| 分类号 | G21K5/04;H05G2/00;G03F7/20 | 主分类号 | G21K5/04 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A discharge produced plasma radiation source, comprising: a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source, the laser beam pulse generator being arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy. | ||
| 地址 | Veldhoven NL | ||