发明名称 |
Apparatus and methods for continuous flow synthesis of semiconductor nanowires |
摘要 |
Apparatuses and methods for synthesizing nanoscale materials are provided, including semiconductor nanowires. Precursor solutions include mixed reagent precursor solutions of metal and chalcogenide precursors and a catalyst, where such solutions are liquid at room temperature. The precursor solutions are mixed by dividing a solution flow into multiple paths and converging the paths to form a uniform solution. A thermally controlled reactor receives the uniform solution to form semiconductor nanowires. Various electronic, optical, and sensory devices may employ the semiconductor nanowires described herein, for example. |
申请公布号 |
US9306110(B2) |
申请公布日期 |
2016.04.05 |
申请号 |
US201414446285 |
申请日期 |
2014.07.29 |
申请人 |
US Nano LLC |
发明人 |
Onicha Anthony C.;Sinks Louise E.;Weber Stefanie L. |
分类号 |
H01L29/06;H01L31/0352;H01L33/04;H01L31/18;B05C3/10 |
主分类号 |
H01L29/06 |
代理机构 |
Whyte Hirschboeck Dudek S.C. |
代理人 |
Whyte Hirschboeck Dudek S.C. |
主权项 |
1. A continuous flow method of producing nanowires, the method comprising:
adding a metal precursor solution to a first continuous flow reactor; adding an anion precursor solution to the first continuous flow reactor; adding a catalyst precursor solution to the first continuous flow reactor; and creating a plurality of metal-anion nanowires having an average length of 1 to 40 μm, an average diameter of 1 to 100 nm, and an average aspect ratio (length to width ratio) of 10:1 to 1000:1; wherein the first continuous flow reactor is maintained at a temperature between, and including, 170° C. to 300° -C. |
地址 |
Sarasota FL US |