发明名称 Apparatus and methods for continuous flow synthesis of semiconductor nanowires
摘要 Apparatuses and methods for synthesizing nanoscale materials are provided, including semiconductor nanowires. Precursor solutions include mixed reagent precursor solutions of metal and chalcogenide precursors and a catalyst, where such solutions are liquid at room temperature. The precursor solutions are mixed by dividing a solution flow into multiple paths and converging the paths to form a uniform solution. A thermally controlled reactor receives the uniform solution to form semiconductor nanowires. Various electronic, optical, and sensory devices may employ the semiconductor nanowires described herein, for example.
申请公布号 US9306110(B2) 申请公布日期 2016.04.05
申请号 US201414446285 申请日期 2014.07.29
申请人 US Nano LLC 发明人 Onicha Anthony C.;Sinks Louise E.;Weber Stefanie L.
分类号 H01L29/06;H01L31/0352;H01L33/04;H01L31/18;B05C3/10 主分类号 H01L29/06
代理机构 Whyte Hirschboeck Dudek S.C. 代理人 Whyte Hirschboeck Dudek S.C.
主权项 1. A continuous flow method of producing nanowires, the method comprising: adding a metal precursor solution to a first continuous flow reactor; adding an anion precursor solution to the first continuous flow reactor; adding a catalyst precursor solution to the first continuous flow reactor; and creating a plurality of metal-anion nanowires having an average length of 1 to 40 μm, an average diameter of 1 to 100 nm, and an average aspect ratio (length to width ratio) of 10:1 to 1000:1; wherein the first continuous flow reactor is maintained at a temperature between, and including, 170° C. to 300° -C.
地址 Sarasota FL US