| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser irradiation system capable of improving the correction accuracy of a laser beam for processing during the processing of an object to be irradiated with the laser beam for processing.SOLUTION: The laser irradiation system according to the embodiment includes a first irradiation part, a second irradiation part, a wavefront sensor, a wavefront changing part, and a control unit. The first irradiation part radiates a first laser beam in which the shape of a wavefront intensity distribution is annular. The second irradiation part radiates a second laser beam which is coaxial to the first laser beam on the inner peripheral side of the first laser beam. The wavefront sensor detects the wavefront of a reflected beam generated by reflecting a laser beam for controlling on an object to be processed with the combination of the first laser beam and the second laser beam set as the combination of a laser beam for processing and the laser beam for controlling. The wavefront changing part changes the wavefront of the laser beam for processing. The control unit controls the wavefront of the laser beam for processing by driving the wavefront changing part according to the signal of the wavefront of the reflected beam output from the wavefront sensor.SELECTED DRAWING: Figure 1 |
