| 摘要 |
To increase an effective pixel region, according to an embodiment, a semiconductor substrate has a first region where a photoelectric conversion device is installed, a second region which is formed around the first region and is installed with a device, and a third region which is formed between the first region and the second region and is installed with the photoelectric conversion device. A first interlayer insulating film is formed on the first region and the third region. A second interlayer insulating film is formed on the second region and is thicker than the first interlayer insulating film. A resin material is formed on a groove formed on a third region side of the first interlayer insulating film, and on the first interlayer insulating film of the first region. |
