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发明名称
Ⅲ族氮化物磊晶基板及其制造方法
摘要
明提供一种可抑制在部件化步骤产生裂碎之Ⅲ族氮化物磊晶基板及其制造方法。
申请公布号
TWI528581
申请公布日期
2016.04.01
申请号
TW101125050
申请日期
2012.07.11
申请人
同和电子科技股份有限公司
发明人
生田哲也;柴田智彦
分类号
H01L33/04(2010.01)
主分类号
H01L33/04(2010.01)
代理机构
代理人
叶璟宗;郑婷文;詹富闵
主权项
一种Ⅲ族氮化物磊晶基板,系具有:Si基板;初始层,系与该Si基板相邻;及超晶格积层体,系形成于该初始层上且具有复数组积层体,该积层体依续具有由A1组成比超过0.5且1以下的AlGaN构成之第1层、及由A1组成比超过0且0.5以下的AlGaN构成之第2层;并且,该第2层的A1组成比随着远离该Si基板而渐减。
地址
日本
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