| 摘要 |
The invention relates to a transfer mask with improved resolution for transfer lithography processes, and a method for the production thereof. Such a mask comprises a transparent carrier T and a functional layer FS arranged on top of it and having absorbing regions AB and reflecting regions RB, the absorbing regions AB and the reflecting regions RB lying in a common plane and being arranged without direct contact to each other, spaced apart by free spaces F. |
