| 发明名称 |
IMPRINT MOLD AND METHOD FOR DESIGNING DUMMY PATTERN |
| 摘要 |
An imprint mold that has, in a pattern region on a principal surface of a base material, a main pattern with an uneven structure and a dummy pattern with an uneven structure for assisting transfer of the main pattern, wherein at least one end portion of a concave structure or a convex structure of the dummy pattern reaches an outermost periphery of the pattern region, and a closed region that is surrounded with one or more concave structures or convex structures of the dummy pattern does not exist in the pattern region when the imprint mold is planarly viewed. |
| 申请公布号 |
US2016091788(A1) |
申请公布日期 |
2016.03.31 |
| 申请号 |
US201414785700 |
申请日期 |
2014.04.16 |
| 申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
ARITSUKA Yuki;NAKATA Naoko |
| 分类号 |
G03F7/00;B29C59/02 |
主分类号 |
G03F7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint mold, comprising, in a pattern region on a principal surface of a base material, a main pattern with an uneven structure and a dummy pattern with an uneven structure for assisting transfer of the main pattern,
wherein at least one end portion of a concave structure or a convex structure of the dummy pattern reaches an outermost periphery of the pattern region, and a closed region that is surrounded with one or more concave structures or convex structures of the dummy pattern does not exist in the pattern region when the imprint mold is planarly viewed. |
| 地址 |
Tokyo JP |
