发明名称 |
INTEGRATED CIRCUIT COMPRISING COMPONENTS, FOR EXAMPLE NMOS TRANSISTORS, HAVING ACTIVE REGIONS WITH RELAXED COMPRESSIVE STRESSES |
摘要 |
An integrated circuit includes a substrate and at least one component unfavorably sensitive to compressive stress which is arranged at least partially within an active region of the substrate limited by an insulating region. To address compressive stress in the active region, the circuit further includes at least one electrically inactive trench located at least in the insulating region and containing an internal area configured to reduce compressive stress in the active region. The internal area is filled with polysilicon. The polysilicon filled trench may further extend through the insulating region and into the substrate. |
申请公布号 |
US2016093696(A1) |
申请公布日期 |
2016.03.31 |
申请号 |
US201514953692 |
申请日期 |
2015.11.30 |
申请人 |
STMicroelectronics (Rousset) SAS |
发明人 |
Bouton Guilhem;Fornara Pascal;Rivero Christian |
分类号 |
H01L29/10;H01L21/763;H01L27/112;H01L21/762 |
主分类号 |
H01L29/10 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method, comprising:
producing, in a semiconductor substrate, an insulating region delimiting an active region of the semiconductor substrate; producing a component unfavorably sensitive to compressive stress at least partially in the active region; forming a trench in the insulating region, said trench extending completely through the insulating region and into the semiconductor substrate; and filling the trench with a material configured to reduce compressive stress in the active region. |
地址 |
Rousset FR |