| 摘要 |
An optical arrangement of a microlithographic projection exposure apparatus (10) comprises a mirror element (M6) having a mirror substrate (34) and a reflection region formed on a surface of the mirror substrate (34). The arrangement additionally includes at least one actuator (46) configured to move the mirror element (M6) in at least one degree of freedom, and a mounting element (42), which acts on the mirror substrate (34). According to the invention, the mounting element (42) alone holds the mirror element (M6) at least approximately in an equilibrium position, such that the at least one actuator (46) is at least approximately free of forces in the equilibrium position. |
