发明名称 Method of forming semiconductor fins and insulating fence fins on a same substrate
摘要 A semiconductor structure may be formed by forming a first semiconductor fin and a second inactive semiconductor fin above a substrate; depositing a masking layer above the first semiconductor fin and the second semiconductor fin; etching a trench in the masking layer exposing the second semiconductor fin while the first semiconductor fin remains covered by the masking layer; removing the second semiconductor fin to form a fin recess beneath the trench; filling the fin recess with an insulating material to form an insulating fence fin; and removing the masking layer to expose the first semiconductor fin and the insulating fence fin. A third semiconductor fin separating the first semiconductor fin from the second semiconductor fin may also be formed prior to depositing the masking layer and covered by the masking layer. The first semiconductor fin may be a pFET fin and the third semiconductor fin may be an nFET fin.
申请公布号 US9299705(B2) 申请公布日期 2016.03.29
申请号 US201414181781 申请日期 2014.02.17
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 Kanakasabapathy Sivananda K.
分类号 H01L27/092;H01L21/8238 主分类号 H01L27/092
代理机构 Scully, Scott, Murphy & Presser, P.C. 代理人 Scully, Scott, Murphy & Presser, P.C. ;Meyers Steven J.
主权项 1. A method of forming a semiconductor structure, the method comprising: forming a first semiconductor fin and a second semiconductor fin above a substrate, wherein the second semiconductor fin comprises an inactive fin; depositing a masking layer above the first semiconductor fin and the second semiconductor fin; etching a trench in the masking layer exposing the second semiconductor fin while the first semiconductor fin remains covered by the masking layer; removing the second semiconductor fin to form a fin recess beneath the trench; filling the fin recess with an insulating material to form an insulating fence fin; and removing the masking layer to expose the first semiconductor fin and the insulating fence fin.
地址 Armonk NY US