| 发明名称 | Mask cover, charged particle beam drawing apparatus and charged particle beam drawing method | ||
| 摘要 | A mask cover according to one embodiment of the present invention comprises a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided on the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin. | ||
| 申请公布号 | US9299531(B2) | 申请公布日期 | 2016.03.29 |
| 申请号 | US201414257641 | 申请日期 | 2014.04.21 |
| 申请人 | NUFLARE TECHNOLOGY, INC. | 发明人 | Asami Yu;Kawaguchi Michihiro |
| 分类号 | G01N21/00;H01J37/02;H01J37/317;H01J37/30 | 主分类号 | G01N21/00 |
| 代理机构 | Patterson & Sheridan, LLP. | 代理人 | Patterson & Sheridan, LLP. |
| 主权项 | 1. A mask cover comprising: a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided at the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin. | ||
| 地址 | Kanagawa JP | ||