| 摘要 |
PROBLEM TO BE SOLVED: To provide a process separation type substrate processing apparatus and processing method that can separate a liquid processing process, such as an etching process, and a cleaning process so as to perform them in different chambers.SOLUTION: An apparatus comprises: a first chamber for performing processes including a liquid processing process to supply a first processing liquid to a substrate; a second chamber for performing processes including a liquid processing process to supply a second processing liquid to the substrate; and a transfer unit for transferring the substrate between the first and second chambers. The processes performed in the first and second chambers are separated to inhibit crystallization in the chambers.SELECTED DRAWING: Figure 1 |
