| 发明名称 |
HEAT TREATMENT APPARATUS |
| 摘要 |
The present invention discloses a heat treatment apparatus, the heat treatment apparatus comprises a hot plate, at least two heat sources, and a switching means, wherein the hot plate serves as the heating medium between the at least two heat sources and the substrate to be processed, the switching means is configured in such a way that the hot plate contacts one or two of the at least two heat sources selectively, the processing temperature of the hot plate can be changed quickly from one temperature to another temperature. |
| 申请公布号 |
US2016088683(A1) |
申请公布日期 |
2016.03.24 |
| 申请号 |
US201314111797 |
申请日期 |
2013.06.30 |
| 申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD. |
发明人 |
OU Weifeng |
| 分类号 |
H05B1/00;H01L21/67;G03F7/16 |
主分类号 |
H05B1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A heat treatment apparatus, comprising a hot plate, at least two heat sources, and a switching means, wherein the hot plate serves as the heating medium between the at least two heat sources and the substrate to be processed, the switching means is configured in such a way that the hot plate contacts one or two of the at least two heat sources selectively. |
| 地址 |
Shenzhen, Guangdong CN |
