发明名称 SCHEDULING APPLICATIONS IN PROCESSING DEVICES BASED ON PREDICTED THERMAL IMPACT
摘要 A processing device includes a plurality of components and a system management unit to selectively schedule an application phase to one of the plurality of components based on one or more comparisons of predictions of a plurality of thermal impacts of executing the application phase on each of the plurality of components. The predictions may be generated based on a thermal history associated with the application phase, thermal sensitivities of the plurality of components, or a layout of the plurality of components in the processing device.
申请公布号 US2016085219(A1) 申请公布日期 2016.03.24
申请号 US201414493189 申请日期 2014.09.22
申请人 Advanced Micro Devices, Inc. 发明人 Paul Indrani;Arora Manish;Eckert Yasuko;Manne Srilatha
分类号 G05B15/02;G06N5/04 主分类号 G05B15/02
代理机构 代理人
主权项 1. A method comprising: selectively scheduling an application phase to one of a plurality of components of a processing device based on at least one comparison of predictions of a plurality of thermal impacts of executing the application phase on each of the plurality of components.
地址 Sunnyvale CA US