APPLICATION SOLUTION FOR RESIST PATTERN COATING

摘要

[Problem] To provide a novel application solution for resist pattern coating. [Solution] An application solution for resist pattern coating including: as component A, a polymer containing at least one hydroxy group or carboxy group; as component B, a sulfonic acid represented by A-SO3H (where A represents a linear or branched alkyl group or alkyl fluoride group having 1-16 carbon atoms, an aromatic group having at least one of these alkyl groups or alkyl fluoride groups as a substituent, or an optionally substituted alicyclic group having 4-16 carbon atoms); and, as component C, an organic solvent capable of dissolving the above polymer, the organic solvent comprising an ether or ketone compound represented by Ｒ１－Ｏ－Ｒ２ and/or Ｒ１－Ｃ（＝Ｏ）－Ｒ２ (where R1 represents a linear, branched, or cyclic alkyl group or alkyl fluoride group having 3-16 carbon atoms, and R2 represents a linear, branched, or cyclic alkyl group or alkyl fluoride group having 1-16 carbon atoms). Also, a method for forming a resist pattern or reverse pattern using this application solution.