发明名称 |
SEMICONDUCTOR DEVICES INCLUDING THROUGH-SILICON-VIAS AND METHODS OF MANUFACTURING THE SAME AND SEMICONDUCTOR PACKAGES INCLUDING THE SEMICONDUCTOR DEVICES |
摘要 |
A semiconductor device can include a substrate that has a surface. A via structure can extend through the substrate toward the surface of the substrate, where the via structure includes an upper surface. A pad structure can be on the surface of the substrate, where the pad structure can include a lower surface having at least one protrusion that is configured to protrude toward the upper surface of the via structure. |
申请公布号 |
US2016086874(A1) |
申请公布日期 |
2016.03.24 |
申请号 |
US201514858572 |
申请日期 |
2015.09.18 |
申请人 |
Choi Ju-Il;Moon Kwang-Jin;Park Byung-Lyul;An Jin-Ho;Fujisaki Atsushi |
发明人 |
Choi Ju-Il;Moon Kwang-Jin;Park Byung-Lyul;An Jin-Ho;Fujisaki Atsushi |
分类号 |
H01L23/48;H01L23/532;H01L23/528;H01L23/00 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a via structure through a substrate, a portion of the via structure exposed above a top surface of the substrate, and the via structure having a top surface of which a central portion is concave and including:
a via electrode including a conductive pattern and a barrier layer pattern surrounding a sidewall of the conductive pattern; andan insulation layer pattern surrounding a sidewall of the via electrode, wherein a top surface of the conductive pattern is lower than that of the insulation layer pattern and is flat, a protection layer pattern structure on the top surface of the substrate, the protection layer pattern structure surrounding a sidewall of the portion of the via structure that is exposed and including a photosensitive organic material; and a pad structure contacting a top surface of the portion of the via structure that is exposed, the pad structure having a flat top surface. |
地址 |
Seongnam-Si KR |