发明名称 |
PROCESS FOR MANUFACTURING SELF-ASSEMBLED BLOCK COPOLYMER FILMS |
摘要 |
Self-assembled block copolymer films having two or more blocks are manufactured by distributing a solution containing at least one block copolymer onto the substrate so as to partially coat a substrate surface, obtaining an intermediate product. A block copolymer is self-assembled by heating the intermediate product. The self-assembling step includes Rapid Thermal Processing, which is performed by heating the intermediate product up to a first target temperature, ranging from a glass transition temperature to an order-disorder transition temperature of the block copolymer, through a temperature rising ramp having a rate of temperature change not lower than 5° C./second; maintaining the intermediate product at the target temperature for a time interval not longer than 60 minutes, whereby a sample is obtained on the surface of which a self-assembled film of the block copolymer has been made; and cooling the sample down to the ambient temperature through a temperature descending ramp. |
申请公布号 |
US2016082472(A1) |
申请公布日期 |
2016.03.24 |
申请号 |
US201414890240 |
申请日期 |
2014.05.09 |
申请人 |
CONSIGLIO NAZIONALE DELLE RICERCHE |
发明人 |
Perego Michele;Seguini Gabriele;Ferrarese Lupi Federico |
分类号 |
B05D3/06;B05D1/00;B05D3/00;C09D153/00 |
主分类号 |
B05D3/06 |
代理机构 |
|
代理人 |
|
主权项 |
1. Process for manufacturing self-assembled block copolymer films, having two or more blocks, comprising the following steps:
A. having a substrate; B. distributing a first solution containing at least one block copolymer onto the substrate so as to at least partially coat a surface of the substrate, obtaining a first intermediate product; C. making a step of self-assembling said at least one block copolymer by heating the first intermediate product;where the self-assembling step C is made through a first RTP process of Rapid Thermal Processing comprising the following substeps:
C.1 heating the first intermediate product up to a first target temperature, ranging from a glass transition temperature Tg of said at least one block copolymer to an order-disorder transition temperature TODT of said at least one block copolymer, through a first temperature rising ramp having a first rate of temperature change not lower than 5° C./second; C.2 maintaining the first intermediate product at said first target temperature for a first time interval not longer than 60 minutes, whereby a sample is obtained on the surface of which a self-assembled film of said at least one block copolymer has been made; C.3 cooling the sample down to the ambient temperature through a first temperature descending ramp. |
地址 |
Rome IT |