| 摘要 |
In the present invention, a substrate processing device includes: circulation piping for forming a circulation passage through which a chemical liquid in a chemical-liquid tank is caused to circulate; supply piping for leading the chemical liquid from the circulation piping to a chemical-liquid nozzle; a supply valve that can be switched between an open state in which the chemical liquid flowing through the supply piping toward the chemical-liquid nozzle is allowed to pass through, and a closed state in which supply of the chemical liquid from the supply piping to the chemical-liquid nozzle is stopped; recovery piping for leading the chemical liquid from a cup to the chemical-liquid tank; and branch piping for leading the chemical liquid in the circulation piping to the recovery piping. |
