发明名称 SHOWER HEAD AND DEPOSITION SYSTEM
摘要 In one embodiment, a shower head for a deposition system is provided. The shower head comprises: a gas injection plate provided with a plurality of gas injection holes extending in the thickness direction; and a gas supply section that provides a plurality of flow paths that guide gas to the plurality of gas injection holes from a common flow path, each of the plurality of flow paths having one end connected to the common flow path and another end. Among the flow paths, any two flow paths that satisfy the condition of a first linear distance between the arranged positions of the ends of one flow path being shorter than a second linear distance between the arranged positions of the ends of the other flow path have a relationship wherein the difference between the length of the one flow path and the first linear distance is larger than the difference between the length of the other flow path and the second linear distance.
申请公布号 WO2016043033(A1) 申请公布日期 2016.03.24
申请号 WO2015JP74703 申请日期 2015.08.31
申请人 TOKYO ELECTRON LIMITED 发明人 IIZUKA YOJI
分类号 C23C16/455;H01L21/205;H01L21/3065 主分类号 C23C16/455
代理机构 代理人
主权项
地址