VAPOUR DEPOSITION DEVICE AND VAPOUR DEPOSITION METHOD

摘要

Provided are a vapour deposition device and a vapour deposition method. The vapour deposition device comprises an evaporation source (10), an electrical charging system (30) and an electromagnetic control system (40), wherein the evaporation source (10) is used for providing an organic vapour; the electrical charging system (30) is used for charging the organic vapour; and the electromagnetic control system (40) is used for controlling the flow rate and flow direction of the charged organic vapour and choosing the organic vapour entering a predetermined region and moving toward a predetermined direction to be deposited onto the surface of a substrate. The vapour deposition device can control the flow direction of the organic vapour, improves the utilization rate of the organic material, avoids cavity contaminations caused by the diffusion of the organic material, reduces the number of baffle cleanings, and saves costs.