CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME

摘要

The present invention relates to a chemical vapor deposition apparatus which enables deposition without rotation of a substrate during a process for depositing a deposition membrane. The present invention further relates to a method for producing a display device using the same. More specifically, provided is a chemical vapor deposition apparatus which comprises: a chamber including an upper chamber and a lower chamber; a susceptor disposed in the chamber so as to support the substrate; a gas spray part disposed on an upper part of the susceptor and supplying process gas for forming a membrane on the substrate; a space separation part disposed in the chamber and partitioning the upper chamber and the lower chamber; and a gas supplying part supplying gas into a lower chamber.