SELECTIVE AND/OR FASTER REMOVAL OF A COATING FROM AN UNDERLYING LAYER, AND SOLAR CELL APPLICATIONS THEREOF

摘要

A method for patterning a film pattern on a substrate includes forming a film pattern on a substrate surface, forming a coating over the substrate and the film pattern and inducing porosity or openings in the coating. At least a part of the coating overlying the film pattern is removed including etching at least one layer underlying the coating ahead of removing at least part of the coating.