| 摘要 |
A photomask (101) comprises a translucent substrate (104) and a light-shielding film (102) which is formed on the translucent substrate (104) and has a light-shielding section (102a) and an opening (102b) forming a translucent region. A plurality of excavated parts (104a) is formed at an exposed region in the opening (102b) of the translucent substrate (104). The plurality of excavated parts (104a) is formed such that each width thereof becomes larger as the width is farther away from the focal point so that the light passing through the plurality of excavated parts (104a) is focused at a prescribed point. |
