| 发明名称 | Method for repairing a mask | ||
| 摘要 | A method for repairing a mask is disclosed. A mask, having multiple defective regions need to be repaired, is received. Locations and sizes of the defective regions are determined. A pre-repair-passivation-treatment (PRPT) is performed to form a passivation membrane over the mask. With the passivation membrane on the mask, a mask repair process is performed to the defective regions on the mask. | ||
| 申请公布号 | US9291890(B2) | 申请公布日期 | 2016.03.22 |
| 申请号 | US201314052189 | 申请日期 | 2013.10.11 |
| 申请人 | Taiwan Semiconductor Manufacturing Company, Ltd. | 发明人 | Huang Yen-Kai;Chu Yuan-Chih |
| 分类号 | G03F1/22;G03F1/72 | 主分类号 | G03F1/22 |
| 代理机构 | Haynes and Boone, LLP | 代理人 | Haynes and Boone, LLP |
| 主权项 | 1. A method for repairing a mask, comprising: receiving a mask having first and second defective regions; performing a first pre-repair-passivation-treatment (PRPT) to form a first passivation membrane over the mask; after forming the first passivation membrane, performing a first repair process on the mask, wherein the first defective region is repaired to form a first repaired defective region; performing a second PRPT to form a second passivation membrane over the mask, including the first repaired defective region; and after forming the second passivation membrane, performing a second repair process on the mask, wherein the second defective region is repaired to form a second repaired defective region. | ||
| 地址 | Hsin-Chu TW | ||