SAMPLE CLEANING APPARATUS AND SAMPLE CLEANING METHOD

摘要

The present invention provides an apparatus or a method for cleaning a sample, capable of suppressing yield reduction. The apparatus or method for cleaning a sample has: a means for ultrasonic-vibrating a sample laid and held on a sample holder disposed inside a treatment chamber; and a means for forming the flow of a gas in a direction along a surface of the sample inside the treatment chamber of an upper part of the sample, thereby discharging a particle separated from the surface of the sample by using the flow of the gas. The apparatus for cleaning a sample includes: a dielectric film placed on the sample holder and having the sample placed thereon; a first and a second electrode electrically insulated from each other inside the dielectric film and disposed adjacent to each other; and a high frequency power supply supplying high frequency power of a frequency in a certain range to the first and second electrodes with the sample held on the sample holder.