| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for a magnetic recording film, which suppresses generation of particle during the sputtering, achieves shortening of the burn-in time, has large magnetic flux leakage, and provides stable discharge during sputtering using a magnetron sputtering apparatus. <P>SOLUTION: A ferromagnetic material sputtering target is a sintered body sputtering target which comprises: a magnetic alloy containing Co as a principal component and having the composition comprising, by mol, ≤20% Cr, ≤30% Pt, and the balance Co; and conductive oxides. The conductive oxides having the average particle size in the range of 10-100 μm are dispersed in the sintered body target. <P>COPYRIGHT: (C)2012,JPO&INPIT |
