发明名称 FILM FORMATION MATERIAL AND FILM FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a film formation material having high heat stability and long-term storage stability, which is a film formation material, especially, which is liquid at room temperature or has a low melting point and rich stability, and which can perform stable supply of a raw material, and can form stably a high-quality film.SOLUTION: A film formation material is shown by a compound represented by LM(OR)[L is a cyclopentadienyl group or a substituted cyclopentadienyl group. M is Ti, Zr or Hf. R is an alkyl group. Each R may be the same or different.].SELECTED DRAWING: Figure 1
申请公布号 JP2016037654(A) 申请公布日期 2016.03.22
申请号 JP20140163365 申请日期 2014.08.11
申请人 TRI CHEMICAL LABORATORY INC 发明人 SASAGAWA KEITA;JO EIKA;HIRAKI TADAAKI;MIHASHI SATOSHI
分类号 C23C16/40;H01L21/316 主分类号 C23C16/40
代理机构 代理人
主权项
地址
您可能感兴趣的专利