发明名称 Diode having trenches in a semiconductor region
摘要 An electrode structure is described in which conductive regions are recessed into a semiconductor region. Trenches may be formed in a semiconductor region, such that conductive regions can be formed in the trenches. The electrode structure may be used in semiconductor devices such as field effect transistors or diodes. Nitride-based power semiconductor devices are described including such an electrode structure, which can reduce leakage current and otherwise improve performance.
申请公布号 US9293538(B2) 申请公布日期 2016.03.22
申请号 US201314082618 申请日期 2013.11.18
申请人 Massachusetts Institute of Technology 发明人 Palacios Tomas Apostol;Lu Bin;Matioli Elison de Nazareth
分类号 H01L31/0256;H01L27/01;H01L27/12;H01L31/0392;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;H01L29/20;H01L21/28;H01L29/872;H01L29/40;H01L29/423;H01L29/778;H01L29/10;H01L29/417;H01L29/51 主分类号 H01L31/0256
代理机构 Wolf, Greenfield & Sacks, P.C. 代理人 Wolf, Greenfield & Sacks, P.C.
主权项 1. A diode, comprising: a semiconductor region having trenches formed therein; a conductive electrode forming an anode of the diode, the conductive electrode including conductive regions formed in the trenches of the semiconductor region; and a cathode, wherein the conductive electrode contacts the semiconductor region inside the trenches, outside the trenches, or both, wherein the semiconductor region includes a III-N semiconductor material, and wherein the semiconductor region is a first semiconductor region, the III-N semiconductor material is a first III-N semiconductor material, and the diode further comprises a second semiconductor region including a second III-N semiconductor material different from the first semiconductor material, wherein the first semiconductor region is between the second semiconductor region and the conductive electrode.
地址 Cambridge MA US
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