发明名称 |
Diode having trenches in a semiconductor region |
摘要 |
An electrode structure is described in which conductive regions are recessed into a semiconductor region. Trenches may be formed in a semiconductor region, such that conductive regions can be formed in the trenches. The electrode structure may be used in semiconductor devices such as field effect transistors or diodes. Nitride-based power semiconductor devices are described including such an electrode structure, which can reduce leakage current and otherwise improve performance. |
申请公布号 |
US9293538(B2) |
申请公布日期 |
2016.03.22 |
申请号 |
US201314082618 |
申请日期 |
2013.11.18 |
申请人 |
Massachusetts Institute of Technology |
发明人 |
Palacios Tomas Apostol;Lu Bin;Matioli Elison de Nazareth |
分类号 |
H01L31/0256;H01L27/01;H01L27/12;H01L31/0392;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;H01L29/20;H01L21/28;H01L29/872;H01L29/40;H01L29/423;H01L29/778;H01L29/10;H01L29/417;H01L29/51 |
主分类号 |
H01L31/0256 |
代理机构 |
Wolf, Greenfield & Sacks, P.C. |
代理人 |
Wolf, Greenfield & Sacks, P.C. |
主权项 |
1. A diode, comprising:
a semiconductor region having trenches formed therein; a conductive electrode forming an anode of the diode, the conductive electrode including conductive regions formed in the trenches of the semiconductor region; and a cathode, wherein the conductive electrode contacts the semiconductor region inside the trenches, outside the trenches, or both, wherein the semiconductor region includes a III-N semiconductor material, and wherein the semiconductor region is a first semiconductor region, the III-N semiconductor material is a first III-N semiconductor material, and the diode further comprises a second semiconductor region including a second III-N semiconductor material different from the first semiconductor material, wherein the first semiconductor region is between the second semiconductor region and the conductive electrode. |
地址 |
Cambridge MA US |