发明名称 |
PEELING APPARATUS AND STACK MANUFACTURING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To improve yield of a peeling process.SOLUTION: A peeling apparatus includes a structure body with a convex surface and a stage with a supporting surface which faces the convex surface. The structure body can hold a first member of a process member between the convex surface and the supporting surface. The stage can hold a second member of the process member. The radius of curvature of the convex surface is less than the radius of curvature of the supporting surface. The linear velocity of the convex surface is greater than or equal to the movement speed of a rotation center of the structure body with respect to the stage. The first member is wound along the convex surface to be separated from the second member.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016036005(A) |
申请公布日期 |
2016.03.17 |
申请号 |
JP20140241478 |
申请日期 |
2014.11.28 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
ONO MASAKATSU;ADACHI HIROKI;IDOJIRI SATORU;TAKESHIMA KOICHI |
分类号 |
H01L21/02;H01L21/336;H01L27/12;H01L29/786;H01L51/50;H05B33/10 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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