| 主权项 |
1. A method for preparing a lithographic printing plate, the method comprising:
(a) imagewise exposing a negative-working lithographic printing plate precursor comprising a substrate having disposed thereon a negative-working radiation-sensitive imageable layer, and optionally, a hydrophilic overcoat disposed on the negative-working radiation-sensitive imageable layer, to provide an exposed precursor comprising exposed regions and non-exposed regions in the negative-working radiation-sensitive imageable layer; (b) optionally heating the exposed precursor to a temperature of at least 60° C. and up to and including 180° C.; (c) optionally washing the exposed precursor to remove the hydrophilic overcoat; (d) treating the exposed precursor with one or more successive applications of a processing solution to provide an exposed and processed precursor, the processing solution having a pH of at least 7 and up to and including 11 and comprising:
component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C., and is present in an amount of at least 1 weight % based on the total processing solution weight;component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C., and is present in an amount of at least 1 weight % based on the total processing solution weight;component (3) that is a hydroxy-containing solution promoter that is present in an amount of at least 0.5 weight % based on the total processing solution weight; andcomponent (4) that is a hydrophilic surface protective compound that can be present in an amount of at least 1 weight % based on the total processing solution weight; (e) optionally, drying the exposed and processed precursor; and (f) mounting the exposed and processed precursor on a printing press, with the proviso that the exposed precursor is not further treated with any liquid between (d) and (f), and
component (2) is represented by the formula:
R—[—Y—O—(CR1R2—CR3R4—O)n—H]m wherein:
R is a substituted or unsubstituted aryl group, provided R contains no ionic group;R1, R2, R3, and R4 are independently hydrogen, methyl, or ethyl;Y is a single bond or a divalent linking group;n is an integer of at least 20 and up to and including 100; andm is an integer of 1 and up to and including 3, and component (2) comprises at least 20 ethylene oxide or propylene oxide units. |
