发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 According to one embodiment, a stacked body including electrode layers and first insulating layers; first semiconductor members extending in the stacked body; a second semiconductor member including first portions and a second portion, the second semiconductor member being connected commonly to lower ends of the first semiconductor members; a memory film provided between a first electrode layer of the first electrode layers and one of the first semiconductor members; and an insulating film provided between the second semiconductor member and the stacked body. A second electrode layer of the electrode layers is provided on the second portion of the second semiconductor member via the insulating film. A third electrode layer of the electrode layers is provided under the second portion of the second semiconductor member via the insulating film. One of the first insulating layers is provided between the second electrode layer and the third electrode layer.
申请公布号 US2016079264(A1) 申请公布日期 2016.03.17
申请号 US201514645765 申请日期 2015.03.12
申请人 Kabushiki Kaisha Toshiba 发明人 INABA Merii
分类号 H01L27/115;H01L21/3213;H01L21/311 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile semiconductor memory device, comprising: a stacked body provided on a foundation layer, the stacked body including electrode layers stacked alternately with first insulating layers; first semiconductor members extending in a stacking direction of the stacked body, the first semiconductor members being provided in the stacked body; a second semiconductor member provided under the first semiconductor members, the second semiconductor member including first portions extending in the stacking direction and a second portion extending in a direction crossing the stacking direction, the first portions and the second portion being provided in the stacked body, the second semiconductor member being connected commonly to lower ends of the first semiconductor members; a memory film provided between a first electrode layer of the electrode layers and one of the first semiconductor members; and an insulating film provided between the second semiconductor member and the stacked body, a second electrode layer of the electrode layers being provided on an upper surface of the second portion of the second semiconductor member via the insulating film, a third electrode layer of the electrode layers being provided under a lower surface of the second portion of the second semiconductor member via the insulating film.
地址 Minato-ku JP