POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND PRODUCTION METHOD THEREOF, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE

摘要

The present invention provides a polymer compound, wherein the polymer compound has a carboxyl group and a siloxane chain and is obtained in the presence of an acid catalyst by condensation of at least; (I) a siloxane compound having phenol groups at both terminals, as shown by the following general formula (1), (II) phenols shown by the following general formula (2) and/or phenols shown by the following general formula (3), and (III) one or more kinds of aldehydes and ketones shown by the following general formula (4). There can be provided a polymer compound which can be used suitably as a base resin of a chemically amplified negative resist composition with which the problem of delamination generated on metal wires such as Cu and Al, an electrode, and a substrate, especially the substrate such as SiN, can be improved, and in addition, with which a fine pattern can be formed without generating a scum and a footing profile in the pattern bottom and on the substrate, using a widely used aqueous 2.38% TMAH solution as a developer.