NOVEL POLYURETHANE COMPOUNDS AND ANTI-REFLECTIVE COATING COMPOSITION CONTAINING THE SAME

摘要

The present invention relates to a novel polyurethane polymer composition to minimize possibility of generating defects of a photoresist pattern shape by minimizing reflected light from a substrate during a semiconductor lithography process, and an anti-reflective coating composition comprising the same. The novel polyurethane polymer compound according to the present invention has a high refractive index and fast speed of etching while having excellent coating properties. The anti-reflective coating composition of the present invention can be used to prepare an anti-reflective coating with a thin and uniform thickness by comprising the polyurethane polymer compound, and is not soluble in organic solvents, thereby minimizing possibility of generating defects of the photoresist pattern shape. The polyurethane compound of the present invention is prepared by conducting condensation polymerization of at least one multivalent isocyanate selected from the group consisting of compounds represented by chemical formula 1 and chemical formula 2 with a multivalent alcohol represented by chemical formula 3.