发明名称 Substrate support with advanced edge control provisions
摘要 Embodiments of the present invention generally provide an apparatus with a recess and a cavity formed therein for future hardware retrofit and uniformity enhancement and methods for controlling the same. In one embodiment, a substrate support includes a supporting body having an outer wall, a ground path disposed against and bounding the outer wall of the supporting body, a mounting plate coupled to a lower surface of the supporting body, wherein the mounting plate includes a lip extending outward from the mounting plate defining an upper surface; and a recess formed at a perimeter of the supporting body above the upper surface of the lip of the mounting plate, the recess lining on the ground path extending at least partially to the mounting plate.
申请公布号 US9287147(B2) 申请公布日期 2016.03.15
申请号 US201313827687 申请日期 2013.03.14
申请人 APPLIED MATERIALS, INC. 发明人 Tantiwong Kyle;Banna Samer
分类号 H01L21/683;H01L21/67;H01L21/687 主分类号 H01L21/683
代理机构 Patterson & Sheridan, LLP 代理人 Patterson & Sheridan, LLP
主权项 1. A substrate support, comprising: a supporting body having an outer wall; a ground path disposed against and bounding the outer wall of the supporting body; a mounting plate coupled to a lower surface of the supporting body, wherein the mounting plate includes a lip extending outward from the mounting plate defining an upper surface; and a recess formed at a perimeter of the supporting body above the upper surface of the lip of the mounting plate, the recess on the ground path extending at least partially to the mounting plate, wherein the supporting body comprises: a substrate supporting plate;a cooling plate coupled to the substrate supporting plate;an inlet/outlet plate coupled to the cooling plate; anda base plate coupled to the inlet and outlet plate.
地址 Santa Clara CA US