| 发明名称 |
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING POLYETHYLENE IMINE |
| 摘要 |
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polyethylene imines (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6. |
| 申请公布号 |
US2016068712(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201414891175 |
申请日期 |
2014.05.05 |
| 申请人 |
BASF SE |
发明人 |
LAN Yongqing;PRZYBYLSKI Peter;BAO Zhenyu;PROELSS Julian |
| 分类号 |
C09G1/02;H01L21/306 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition comprising:
surface modified silica particles having a negative zeta potential of −15 mV or below at a pH of 2 to 6, one or more polyethylene imines, and water; wherein the composition has a pH of 2 to 6. |
| 地址 |
Ludwigshafen DE |
