PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.

主权项

1. A pattern forming method comprising:
a step of forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; a step of exposing the active light sensitive or radiation sensitive film; and a step of forming a negative-type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer including an organic solvent, wherein the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) having an acidic group and a lactone structure and of which, a polarity is increased by an action of an acid and thus a solubility with respect to the developer including an organic solvent is decreased.