VAPORIZING APPARATUS USING IN SEMICONDUCTOR EQUIPMENT

摘要

According to one embodiment of the present invention, provided is a vaporizer for a semiconductor device, capable of increasing an evaporation rate and being miniaturized. The vaporizer includes: a first vaporizing unit; a second vaporizing unit having a floating space allowing a gas introduced from the first vaporizing unit to float, wherein an entrance and an exit of the floating space is formed to be spaced from each other at a certain interval in a lateral direction and a vertical direction; and a discharge unit through which the gas is discharged to the outside from the second vaporizing unit.