发明名称 MULTILEVEL MASK CIRCUIT FABRICATION AND MULTILAYER CIRCUIT
摘要 Circuit fabrication uses a multilevel mask to pattern a first conductor layer of a multilayer circuit. The first conductor patterning is to provide electrical isolation between the first conductor layer and a second conductor layer that one of overlies the multilevel mask and underlies the multilevel mask. With the second conductor layer overlying the multilevel mask, the electrical isolation is provided by undercutting the multilevel mask. Alternatively, with the second conductor underlying the multilevel mask, the first conductor includes a bridged gapped conductor and the electrical isolation may be provided by both the bridged gapped conductor and an insulating layer between the second conductor layer and the first conductor layer.
申请公布号 EP2992407(A1) 申请公布日期 2016.03.09
申请号 EP20130883471 申请日期 2013.04.30
申请人 APPLIED MATERIALS, INC. 发明人 MEI, PING;TAUSSIG, CARL P.;ALMANZA-WORKMAN, MARCIA
分类号 G06F3/044;H01L21/3213;H01L21/768;H01L23/482;H01L23/528 主分类号 G06F3/044
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