| 摘要 |
The present invention is a method which processes a substrate, using a block copolymer including a first polymer and a second polymer, wherein: a neutral layer having an intermediate affinity with respect to the first polymer and the second polymer is formed upon a substrate; with respect to the substrate whereupon a resist layer is formed upon the neutral layer, an exposed face of the neutral layer which is exposed from the resist layer is surface processed; thereafter, with respect to the substrate whereupon the resist pattern has been removed, a block copolymer is coated upon the neutral layer; and the block copolymer upon the neutral layer is phase separated into the first polymer and the second polymer. |
