| 摘要 |
According to an embodiment of the present invention, a manufacturing method of a microphone comprises: a step of preparing a substrate, and then forming an oxide film pattern on the substrate and an oxide film on the rear surface of the substrate; a step of using the oxide film pattern as a mask to inject conductive ions on the substrate for forming a vibration film; a step of removing the oxide film pattern, and then sequentially forming a sacrificial layer and a fixing electrode on the substrate and the vibration film; a step of forming a first photosensitive film pattern on the fixing electrode, and then using the first photosensitive film pattern as a mask to pattern the fixing electrode to form an air inlet; a step of forming a second photosensitive film pattern on the rear surface of the oxide film, and then etching the rear surfaces of the oxide film and the substrate to form a through hole to expose a portion of the vibration film; and a step of removing a portion of the sacrificial layer to form an air layer between the fixing electrode and the vibration film. |
