Illumination system for microlithography

摘要

A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.

主权项

1. A raster arrangement, comprising:
first and second types of raster elements which have different bundle-influencing effects, wherein:
the raster arrangement comprises a first surface and a second surface which is opposite the first surface;the raster arrangement is configured so that, during use of the raster arrangement, light passes through the first and second surfaces of the raster arrangement;the raster arrangement comprises a first raster area and a second raster area;the first raster area comprises a raster element of the first raster element type;the second raster area comprises a raster element of the second raster element type;in the first raster area, there is a minimum distance between the first and second surfaces of the raster arrangement;in the second raster area, there is a minimum distance between the first and second surfaces of the raster arrangement;the minimum distance between the first and second surfaces of the first raster arrangement in the first raster area is different from the minimum distance between the first and second surfaces of the raster arrangement in the second raster area; andthe raster arrangement is configured to be used in a microlithography illumination system.