Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method

摘要

A thin film deposition apparatus includes: a deposition source for discharging a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and having a plurality of patterning slits arranged in the first direction; a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, the plurality of barrier plates partitioning a deposition space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; and a capacitive vacuum gauge disposed at a side of the deposition source and configured to measure a pressure inside the deposition source.

主权项

1. A method of manufacturing a display device, the method comprising:
disposing a thin film deposition apparatus apart from a substrate, which is a deposition target substrate and is fixedly supported by a chuck; and performing deposition on the substrate while the thin film deposition apparatus and the substrate are moved relative to each other, wherein the thin film deposition apparatus comprises:
a deposition source discharging a deposition material;a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction;a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction perpendicular to the first direction; anda capacitive vacuum gauge disposed at a side of the deposition source and measuring pressure inside the deposition source, wherein deposition is performed while the substrate is moved relative to the thin film deposition apparatus in the first direction, and wherein the capacitive vacuum gauge comprises:
a housing;a first vacuum tube connecting the housing to the deposition source;a diaphragm disposed in the housing, and dividing the inside of the housing into two parts; andan electrode assembly configured to induce a capacitance according to a distance between the electrode assembly and the diaphragm.