| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which improves pattern rectangularity in addition to LWR for a line-and-space pattern, as well as circularity for a contact hole pattern and circularity holding capability for a narrow pitch pattern, suitable for liquid immersion process for a line width of 45 nm or less; and a pattern formation method using the same.SOLUTION: A radiation-sensitive resin composition contains a polymer [A] having a structural unit (I) represented by the following formula (1) and an acid generating material [B] including a compound represented by the following formula (2). |
