| 主权项 |
1. A feed-through apparatus for a chemical vapour deposition device, the feed-through apparatus comprising:
a feed-through main body; a plurality of runner units being provided within the feed-through main body, each runner unit comprising
a fluid inlet for receiving a fluid, andan elongated runner in fluid communication with the fluid inlet that is operative to receive the fluid from the fluid inlet, and the elongated runner extending spirally on a surface of the runner unit; and a feed-through device rotatable with respect to the plurality of runner units, the feed-through device comprising a plurality of feed-through device fluid channels, each feed-through device fluid channel comprising at least one feed-through device fluid transfer orifice and at least one feed-through device fluid outlet orifice, each feed-through device fluid transfer orifice being in fluid communication with a corresponding elongated runner during rotation of the feed-through device that is operative to receive fluid from the corresponding elongated runner, each feed-through device fluid outlet orifice being provided for releasing the fluid into a reactor chamber, wherein the elongated runner is operative to transport the fluid to the feed-through device through the elongated runner. |
