发明名称 A RECESSED SALICIDE STRUCTURE TO INTEGRATE A FLASH MEMORY DEVICE WITH A HIGH κ METAL GATE LOGIC DEVICE
摘要 Provide is an integrated circuit (IC) for an embedded flash memory device. The IC includes a flash memory cell having a memory cell gate. A silicide contact pad is arranged in a recess of the memory cell gate. A top surface of the silicide contact pad is recessed relative to a top surface of the memory cell gate. Dielectric side-wall spacers extend along sidewalls of the recess from the top surface of the memory cell gate to the top surface of the silicide contact pad.
申请公布号 KR20160024724(A) 申请公布日期 2016.03.07
申请号 KR20140186929 申请日期 2014.12.23
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHUANG HARRY HAK LAY;WU WEI CHENG;LIU SHIH CHANG;KAO YA CHEN
分类号 H01L27/115 主分类号 H01L27/115
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